Ahmad Khder, Mohamad Ali Salameh and Moustafa Hasan Al-Mawaldi
Keywords: Thin Films, Plasma polymerization, HMDSO, PECVD, Tafel Polarization, Atomic Force Microscope (AFM), Quartz Crystal Microbalance QCM
Abstract:
<p class="MsoNormal" style="margin-bottom:0cm;margin-bottom:.0001pt;text-align:
justify;line-height:normal;direction:ltr;unicode-bidi:embed">This study aims to deposit Plasma-polymerized Hexamethyldisiloxane
(HMDSO) thin films on Titanium (Ti) and silicon (100) substrates using Plasma
Enhanced Chemical Vapor Deposition (PECVD). The pp-HMDSO thin films were
deposited on commercial Titanium substrates for electrochemical tests, using
Tafel polarization technique to define the corrosion resistance improvement of
these films, after their immersion for ten days at room temperature (25°C) in a
corrosive solution (0.9% NaCl), compared with reference substrate. For
structural and morphological<b> </b>surface analysis of coated and uncoated
samples, Optical Microscope and Atomic Force Microscope (AFM) techniques were
used. Quartz Crystal Microbalance (QCM) was used to calculate the thickness of
pp-HMDSO thin film, which was deposited just under the same conditions for the
other thin films. Micro-hardness was also performed on coated and reference
samples. The obtained results showed promising corrosion protection and mechanical
properties of the pp-HMDSO thin films, so these attractive findings may allow
to use these thin films in the field of medical tools or equipment (equivalent
to saline serum media).</p>
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