Ahmad Khder, Mohamad Ali Salameh and Moustafa Hasan Al-Mawaldi
Keywords: Thin Films, Plasma polymerization, HMDSO, PECVD, Tafel Polarization, Atomic Force Microscope (AFM), Quartz Crystal Microbalance QCM
<p class="MsoNormal" style="margin-bottom:0cm;margin-bottom:.0001pt;text-align: justify;line-height:normal;direction:ltr;unicode-bidi:embed">This study aims to deposit Plasma-polymerized Hexamethyldisiloxane (HMDSO) thin films on Titanium (Ti) and silicon (100) substrates using Plasma Enhanced Chemical Vapor Deposition (PECVD). The pp-HMDSO thin films were deposited on commercial Titanium substrates for electrochemical tests, using Tafel polarization technique to define the corrosion resistance improvement of these films, after their immersion for ten days at room temperature (25°C) in a corrosive solution (0.9% NaCl), compared with reference substrate. For structural and morphological<b> </b>surface analysis of coated and uncoated samples, Optical Microscope and Atomic Force Microscope (AFM) techniques were used. Quartz Crystal Microbalance (QCM) was used to calculate the thickness of pp-HMDSO thin film, which was deposited just under the same conditions for the other thin films. Micro-hardness was also performed on coated and reference samples. The obtained results showed promising corrosion protection and mechanical properties of the pp-HMDSO thin films, so these attractive findings may allow to use these thin films in the field of medical tools or equipment (equivalent to saline serum media).</p>
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